Lawrence Technological University

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Lawrence Technological University is a small Private not-for-profit, 4-year college located in Southfield, MI. The acceptance rate is 82% and the average in-state tuition cost is $38,370 .

  • Address: 21000 West Ten Mile Road, Southfield, MI 48075-1058
  • Phone: (248) 204-4000
  • Website: www.ltu.edu/
  • Type: Private not-for-profit, 4-year
  • Student Population: 2,966
  • Student-to-Faculty Ratio: 11 to 1
  • Calendar System: Semester
  • Application Fee: $30
  • Selectivity: Less Selective

Cost

Tuition and Fees $39,570
Books and Supplies $1,662
Room & Board $11,320
Other $4,857
Total Cost $57,409

Tuition and Cost Breakdown

Admissions

  • Acceptance Rate: 82%
  • SAT Range: 0 – 0
  • ACT Range: 0 – 0

More About Admissions

Majors

The most popular Lawrence Technological University majors are:

  1. Mechanical Engineering
  2. Electrical and Electronics Engineering
  3. Architectural and Building Sciences/Technology
  4. Computer Science
  5. Registered Nursing/Registered Nurse

View All Majors

Enrollment

Lawrence Technological University has a total enrollment of 2,966 students

Attendance Status

  • Full-time: 74%
  • Part-time: 26%

Student Gender

  • Male: 68%
  • Female: 32%

Student Race/Ethnicity

  • American Indian or Alaskan: 0%
  • Asian: 4%
  • Black or African American: 11%
  • Hispanic / Latino: 4%
  • Native Hawaiian or Pacific Islander: 0%
  • White: 53%
  • Two or More Races: 2%
  • Unknown: 10%
  • Non-resident Alien: 15%

Student Age

  • 24 and Under: 95%
  • 25 and Over: 5%
  • Age Unknown: 0%

Student Residence

  • In-State: 77%
  • Out-of-State: 23%
  • Unknown: 0%

The data on this website is sourced as public domain data from the most recent survey year of the National Center for Education Statistics’ College Navigator tool. That tool can be found at this link: https://nces.ed.gov/collegenavigator/. MyCollegeSelection encourages students to explore multiple resources is part of the research process in selecting the college of their dreams.